News Story

Oehrlein, Phaneuf Paper Among AVS' Most Downloaded

Oehrlein, Phaneuf Paper Among AVS' Most Downloaded

A paper by Department of Materials Science and Engineering professors Gottlieb Oehrlein (joint, Institute for Research in Electronics and Applied Physics)and Ray Phaneuf and colleague David Graves (University of California, Berkeley) is among the most downloaded from the American Vacuum Society's digital library.

"Plasma-polymer interactions: A review of progress in understanding polymer resist mask durability during plasma etching for nanoscale fabrication," originally published in the Journal of Vacuum Science and Technology B, focuses on plasma-polymer interaction mechanisms during pattern transfer by plasma etching, in particular the challenges faced when manufacturing devices below 30 nanometers in size.

For More Information:

See "Plasma-polymer interactions: A review of progress in understanding polymer resist mask durability during plasma etching for nanoscale fabrication," Gottlieb S. Oehrlein, Raymond J. Phaneuf, and David B. Graves, J. Vac. Sci. Technol. B 29, 010801 (2011) Read the paper online »

Visit Professor Oehrlein's web site »

Visit Professor Phaneuf's web site »

June 6, 2011


Prev   Next