Event
MSE Seminar Series: Jun Ouyang
Friday, March 27, 2015
1:00 p.m.-2:00 p.m.
Room 2110, Chemical and Nuclear Engineering Bldg.
JoAnne Kagle
301 405 5240
jkagle@umd.edu
Design, Synthesis and Processing of Functional Thin Films and Coatings via Magnetron Sputtering
Jun Ouyang
Visiting Professor at UMD
Magnetron sputtering, a form of Physical Vapor Deposition/“PVD”, is both a widely adopted thin film deposition technique in a R&D environment and an industrially scalable manufacturing process with minimum environmental impacts. High quality thin film materials or coatings can be developed via magnetron sputtering, which have broad applications in multiple technological fields, including MEMS, microelectronics and data storage, energy, machine tools & tribology etc. In this talk, fundamental concepts as well as general design methods and application-oriented processes of magnetron sputtering will be introduced. Great promise of this technology in advanced manufacturing will be demonstrated by the following two case studies:
(1) Design & fabrication of strain-engineered lead-free ferroelectric/multiferroic films with excellent functional properties;
(2) Solving the dilemma hard coatings have been facing with the next generation sputtering technique
The presenter will conclude this talk with his vision for future research.
About the Speaker:
Dr. Jun Ouyang, Ph.D. '05 in Materials Science & Engineering from the University of Maryland, College Park (UMCP), is currently a visiting Professor at UMCP. Since his Ph.D. study, he has accumulated more than 10 years of combined experience in academia and industry on PVD processing of thin films & coatings. In 2010, Dr. Ouyang resigned from Seagate Technology where he worked as a R&D staff and rejoined academia. Since then, he’s been conducting applied research projects in functional oxide thin films and coating materials, using magnetron sputtering as the main deposition method.