| National Institute for Standards and Technology (NIST) |
G. W. Rubloff - collaborations and support for chemical sensors, metrology, and process control in semiconductor manufacturing |
| Laboratory for Physical Sciences (LPS/NSA) |
R. Phaneuf - collaborations and support for investigations of patterning for directed sel-assembly, LEEM development, and surface sensitive electron microscopies for device characterization |
| NASA Goddard Space Flight Center (GSFC) |
A. Christou - surface analysis of contamination on optical coatings; degradation of high power semiconductor laser diodes; VCSEL arrays for LIDAR applications |
| Army Research Laboratory (ARL) - Adelphi |
A. Christou - processing of VCSEL arrays; finite element analysis of thermomechanical stresses in biased devices; diamond substrate metallization; modulator design on non-(100) InP |
| Army Research Laboratory (ARL) - Aberdeen |
A. Christou - high g loaded microelectronics and packaging; FEM simulation |
| National Institutes of Health (NIH) |
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ITC-irst FBK Division
Trento, Italy |
G. W. Rubloff, R. Briber - surface and thin film nanomaterials, biomaterials/bioMEMS, and combinatorial approaches to materials research |