IBM | R. Briber and G. W. Rublofff - nanoporous low-K dielectrics for advanced interconnects |
Texas Instruments | G. W. Rubloff - in-situ, real-time chemical sensing for advanced process control |
Motorola | R. Ramesh - collaborations on high-K dielectrics and ferroelectrics |
Semiconductor Research Corporation (SRC) | G. S. Oehrlein - plasma processing and diagnostics |
G. W. Rubloff - environmental impacts and optimization in semiconductor manufacturing | |
Semiconductor Industry Associates (SIA) | G. W. Rubloff - Metrology Working Group for International Technology Roadmap for Semiconductors |
Sematech | G. W. Rubloff - metrology for advanced process control under National Semiconductor Metrology Program at NIST |
G. S. Oehrlein - plasma processing and diagnostics |