The Laboratory for Plasma Processing of Materials, part of the Institute for Research in Electronics and Applied Physics and the Department of Materials Science and Engineering, produces nanostructures using plasma processing. The lab's major scientific themes are the characterization and understanding of the processes at the plasma-material interface that control the properties of the material or structure that is ultimately produced. The facility features an array of state-of-the-art tools for plasma-based etching, synthesis or modification of materials, including plasma reactors for producing either highly ionized plasmas and reactors in which the charged particle density is negligible but reactive atoms or molecular radicals formed in a remote plasma chamber interact with the material to be modified; instruments that characterize the plasma or the surfaces of plasma-treated materials; and measurement tools that evaluate the crucial variables that determine the ultimate usefulness of the materials and structures produced. The lab's studies involve many collaborative efforts with industrial laboratories and universities throughout the world.
Gottlieb S. OehrleinProfessor
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