Faculty Directory

Oehrlein, Gottlieb S.

Oehrlein, Gottlieb S.

Professor
Materials Science and Engineering
Institute for Research in Electronics & Applied Physics
2119 Chemical and Nuclear Engineering Building

EDUCATION

 

Ph.D., State University of New York–Albany, 1981

 

BACKGROUND

 

Download Profesor Oehrlein's C.V. (PDF)

Prior to joining the A. James Clark School of Engineering at the University of Maryland in 2000, Professor Oehrlein was a member of the Department of Physics faculty at the State University of New York–Albany from 1993 to 2000, and a research staff member in IBM's Division of Research at the T.J. Watson Research Center, in Yorktown Heights, NY.

 

HONORS AND AWARDS

 

  • 2017 International Plasma Chemistry Society Fellow
  • 2010 IBM Faculty Award
  • 2005 Plasma Prize, Plasma Science and Technology Division, American Vacuum Society
  • 2003 Invention of the Year Finalist for Method and Device for Nanoscale Plasma Processing of Materials (US Patent #7470329), UMD Office of Technology Commercialization
  • 2002 IBM Faculty Award
  • Fellow, International Union of Pure and Applied Chemistry (2000)
  • Fellow, American Vacuum Society (1998)
  • Thinker Award of Tegal Corporation, SEMICON West (1993)
  • Electronics Division Award of the Electrochemical Society (1992)
  • Six IBM Invention Plateau Awards (1982-1993)
  • IBM Outstanding Technical Achievement Award (1989)
  • Solid State Science and Technology Young Author's Award of the Electrochemical Society (1985)
  • State University of New York Chancellor's Honors Convocation Award for Academic Excellence and a Distinguished Dissertation (1982)
  • Fellow, Institute of International Education, New York (1980)
  • Presidential Fellow, State University of New York, Albany (1978-1981)

 

 

Applications of low-temperature plasma science and technology to materials processing, surface chemistry and physics of thin film growth, etching and modification, plasma-surface and plasma-polymer interactions, in-situ plasma and surface diagnostics, physics and chemistry of ion-induced surface processes and of imaging and templating materials, nanoscale structure and device fabrication and characterization, surface and bulk defects of materials.


For a complete list of publications, please visit Professor Oehrlein's web site

"Characterization and Mechanism of He Plasma Pretreatment of Nanoscale Polymer masks for Improved Pattern Transfer Fidelity," F. Weilnboeck, D. Metzler, N. Kumar, G. S. Oehrlein, R. L. Bruce, S. Engelmann, and N. Fuller, Appl. Phys. Letts. 99, 261501 (2011) (doi: 10.1063/1.3671995).

"Plasma-Polymer Interactions: A Review of Progress in Understanding Polymer Resist Mask Durab ility during Plasma Etching for Nanoscale Fabrication," G. S. Oehrlein, R. J. Phaneuf, and D. B. Graves, J. Vac. Sci. Technol. B 29 [1], 010801 (2011). (doi: 10.1116/1.3532949)

"Poly (2-vinyl naphthalene-b-acrylic acid) Block Copolymer Pattern Formation, Alignment and Pattern Transfer into Silicon by Reactive Ion Etching," Xin Zhang, Christopher Metting, R. M. Briber, Florian Weilnboeck, Sang Hak Shin, Ben Jones, and Gottlieb S. Oehrlein, Macromolecular Chemistry and Physics 212, 1735-1741 (2011). (doi: 10.1002/macp.201100232)

"On the Absence of Post-Plasma Etch Surface and Line Edge Roughness in Vinylpyridine Resists," R. L. Bruce, F. Weilnboeck, T. Lin, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, C. G. Willson, and A. Alizadeh, J. Vac. Sci. Technol. B 19, 041604 (2011). (doi: 10.1116/1.3607604)

"Ion and Vacuum Ultraviolet Photon Beam Effects in 193 nm Photoresist Surface Roughening: The Role of the Adamantyl Pendant Group," T. Y. Chung, D. B. Graves, F. Weilnboeck, R. L. Bruce, G. S. Oehrlein, M. Q. Li, and E. A. Hudson, Plasma Processes and Polymers 8, 1068-1079 (2011). (doi: 10.1002/ppap.201100071)

"Hydrogenation and Surface Density Changes in Hydrocarbon Films during Erosion Using Ar/H2Plasmas," N. Fox-Lyon, G. S. Oehrlein, N. Ning, D. B. Graves, J. Appl. Phys. 110, 104314 (2011). (doi: 10.1063/1.3662953)

"Molecular Structure Effects on Dry Etching Behavior of Si-containing Resists in Oxygen Plasma," R. L. Bruce, T. Lin, R. J. Phaneuf, G. S. Oehrlein, W. Bell, B. Long, and C. G. Willson, J. Vac. Sci. Technol. B 28 [4], 751 (2010). (doi: 10.1116/1.3455496)

"Role of Polymer Structure and Ceiling Temperature in Polymer Roughening and Degradation during Plasma Processing: A Beam System Study of P4MS and P alpha MS," D. Nest, T. Y. Chung, J. J. Vegh, D. B. Graves, R. L. Bruce, T. Lin, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, and C. G. Willson, J. Phys. D - Appl. Phys. 43, 085204 (2010). (doi: 10.1088/0022-3727/43/8/085204)

"Relationship between Nanoscale Roughness and Ion-Damaged Layer in Argon Plasma Exposed Polystyrene Films," R. L. Bruce, F. Weilnboeck, T. Lin, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, C. G. Willson, J. J. Vegh, D. Next and D. B. Graves, J. Appl. Phys. 107, 084310 (2010). (doi: 10.1063/1.3373587)

"Electron, Ion and Vacuum Ultraviolet Photon Effects in 193 nm Photoresist Surface Roughening," T. Y. Chung, D. Nest, D. B. Graves, F. Weilnboeck, R. L. Bruce, G. S. Oehrlein, D. Wang, M. Li, and E. A. Hudson, J. Phys. D - Appl. Phys. 43 [27], 272001 (2010). (doi: 10.1088/0022-3727/43/27/272001 )

"Photoresist Modifications by Plasma Vacuum Ultraviolet Radiation: The Role of Polymer Structure and Plasma Chemistry," F. Weilnboeck, R. L. Bruce, S. Engelmann, G. S. Oehrlein, D. Nest, T.-Y. Chung, D. Graves, M. Li, D. Wang, C. Andes, and E. A. Hudson, J. Vac. Sci. Technol. B 28 [5], 993 (2010). (doi: 10.1116/1.3484249)

"Real-Time and Post-Plasma Studies of Influence of Low Levels of Tungsten on Carbon Erosion and Surface Evolution Behaviour in D2 Plasma," F. Weilnboeck, N. Fox-Lyon, G. S. Oehrlein, and R. P. Doerner, Nucl. Fusion 50, 025027 (2010). (doi: 10.1088/0029-5515/50/2/025027)

"Surface and Near-Surface Modifications of Ultralow Dielectric Constant Materials Exposed to Plasmas under Sidewall-Like Conditions," Ming-Shu Kuo and G. S. Oehrlein, J. Vac. Sci. & Technol. B 28 [6], (2010). (doi: 10.1116/1.3499271)

"Mechanistic Study of Ultralow K-Compatible Carbon Dioxide in situ Photoresist Ashing Processes. I. Process Performance and Influence on ULK Material Modification," Ming-Shu Kuo, A. R. Pal, G. S. Oehrlein, P. Lazzeri, and M. Anderle, J. Vac. Sci. & Technol. B 28 [5], (2010). (doi: 10.1116/1.3482343)

"Mechanistic Study of Ultralow k-Compatible Carbon Dioxide in Situ Photoresist Ashing Processes. II. Interaction with Preceding Fluorocarbon Plasma Ultralow k Etching Processes," Ming-Shu Kuo, A. R. Pal, and G. S. Oehrlein, J. Vac. Sci. Technol. B 28 [5], 961 (2010). (doi: 10.1116/1.3482353)

"Influence of C4F8/Ar Based Etch and H2 Based Remote Ash Processes on ULK Materials Modifications," M.-S. Kuo, X. Hua, G. S. Oehrlein, A. Ali, P. Jiang, P. Lazzeri, and M. Anderle, J. Vac. Sci. Technol. B 28 [2], 284 (2010). (doi:10.1116/1.3308623)

"Stages in the Interaction of Deuterium Atoms with Amorphous Hydrogenated Carbon Films: Isotope Exchange, Soft-Layer Formation, and Steady-State Erosion," G. S. Oehrlein, T. Schwarz-Selinger, K. Schmid, M. Schlüter, and W. Jacob, J. Appl. Phys. 108, 043307 (2010). (doi:10.1063/1.3474988)

"Plasma-Surface Interactions of Advanced Photoresists with C4F8/Ar Discharges: Plasma Parameter Dependencies," S. Engelmann, R. L. Bruce, M. Sumiya, T. Kwon, R. Phaneuf, G. S. Oehrlein, C. Andes, D. Graves, D. Nest, and E. A. Hudson, J. Vac. Sci. & Technol. B 27 [1], 92 (2009). (doi: 10.1116/1.3054342)

"Real-Time Studies of Surface Roughness Development and Reticulation Mechanisms of Advanced Photoresist Materials during Plasma Processing," A. R. Pal, R. L. Bruce, F. Weilnboeck, S. Engelmann, T. Lin, M.-S. Kuo, R. Phaneuf, and G. S. Oehrlein, J. Appl. Phys. 105, 031133 (2009). (doi: 10.1063/1.3055268 )

"Low-Temperature Plasma-Assisted Nanotransfer Printing between Thermoplastic Polymers," D. Y. Lee, D. R. Hines, C. M. Stafford, C. L. Soles, E. K. Lin, and G. S. Oehrlein, Adv. Mater. 21, 1 (2009). (doi: 10.1002/adma.200803121)

MSE Professor Recognized by AVS and Dry Process Symposium

Gottlieb Oehrlein bestowed the John Thornton Memorial Award and the DPS Nishizawa Award.

Novel Food Sanitation Method Uses Plasma Science to Sterilize Food with the Flip of a Switch

Researchers published findings showing 99% E.coli elimination using nothing but air and a little electricity.

 Journal of Vacuum Science and Technology Recognizes Oehrlein

MSE faculty member recognized for coauthoring various scientific works.

Rubloff One of 9 Finalists for UMD Invention of the Year

Office of Technology Commercialization to announce winners at the Celebration of Innovation and Partnerships, April 29.

Invention of the Year Finalist

unprecedented etching control of a material, one atomic layer at a time

“Milestone for Atomic Layer Etching” Highlighted by AVS

UMD–IBM’s new technique is precise, controlled, and self-limiting.

How Technology Choices Affect Us All: I-Course Examines Contexts and Consequences

ENMA 289A designed to fulfill core physical science requirement for students in non-science majors.

Three MSE Students Win NSF Graduate Research Fellowships

Epstein, Godo and Nilsson receive highly competitive awards.

Oehrlein, Phaneuf Paper Among AVS' Most Downloaded

Work covers plasma-polymer interactions in photolithography at the nanoscale.

Plasma for Disinfection Study Wins DOE Grant

Oehrlein, Seog will be first to characterize effects on biological molecules at the monolayer level.

Oehrlein Receives IBM Faculty Award

Gift recognizes importance of nanofabrication research to electronics industry.

Feodor Lynen Fellow Joins MSE and IREAP

Evelina Vogli to study use of plasma in specialized coating production.

Bruce Wins 2009 AVS Student Merit Award

Grad student recognized for plasma etching work.

Bruce to Attend NSF Program in Australia

Program fosters collaborations, provides project leadership training.

Oehrlein Studies Plasma/Wall Interactions on Sabbatical

Professor invited to Germany for his expertise on plasma-surface interaction.

5 MSE Professors Recognized for Sponsored Research

Briber, Oehrlein, Phaneuf, Rubloff, and Wuttig honored at luncheon.

Oehrlein and Phaneuf Receive NSF Grant for Nano Research

Two MSE professors were awarded a NSF-NIRT grant for $1.2M to investigate "Nanotechnological Manufacturing: Nanostructured Polymers Designed for Plasma/Energetic Beam Templating of Materials".

Toshiba's Tomohiro Iguchi arrives as ISR Visiting Scientist

August 2004—Researcher will be working on microelectronics process technology.