Oehrlein, Gottlieb S.
Fellow, International Plasma Chemistry Society
Fellow, International Union of Pure and Applied Chemistry
Institute for Research in Electronics & Applied Physics
Laboratory for Plasma Processing of Materials
- Ph.D., Physics, State University of New York at Albany, 1981
- M.S., Physics, State University of New York at Albarny, 1978
- Vordiplom, Physics, Wurzburg University, Germany, 1976
Professor Oehrlein received a Vordiplom in physics from Würzburg University (Germany) in 1976, and M.S. and Ph.D. degrees in physics from the State University of New York at Albany in 1978 and 1981, respectively. Prior to joining the A. James Clark School of Engineering at the University of Maryland in 2000, Professor Oehrlein was a member of the Department of Physics faculty at the State University of New York–Albany from 1993 to 2000, and a research staff member in IBM's Division of Research at the T.J. Watson Research Center, in Yorktown Heights, NY.
HONORS AND AWARDS
- Nishizawa Award, International Symposium on Dry Process (2019)
- John Thornton Memorial Award, American Vacuum Society (2019)
- Most Valuable Reviewer, Journal of Vacuum Science and Technology (2019)
- Fellow, International Plasma Chemistry Society (2017)
- IBM Faculty Award (2010)
- Plasma Prize, Plasma Science and Technology Division, American Vacuum Society (2005)
- Invention of the Year Finalist for Method and Device for Nanoscale Plasma Processing of Materials (US Patent #7470329), UMD Office of Technology Commercialization (2003)
- IBM Faculty Award (2002)
- Fellow, International Union of Pure and Applied Chemistry (2000)
- Fellow, American Vacuum Society (1998)
- Thinker Award of Tegal Corporation, SEMICON West (1993)
- Electronics Division Award of the Electrochemical Society (1992)
- Six IBM Invention Plateau Awards (1982-1993)
- IBM Outstanding Technical Achievement Award (1989)
- Solid State Science and Technology Young Author's Award of the Electrochemical Society (1985)
- State University of New York Chancellor's Honors Convocation Award for Academic Excellence and a Distinguished Dissertation (1982)
- Fellow of the Institute of International Education, New York (1980)
- Presidential Fellow, State University of New York, Albany (1978-1981)
Professor Oehrlein's research interests include scientific and technological aspects of materials processing using partially ionized gases or plasmas. Low-temperature plasmas are characterized by a gas temperature that remains close to ambient temperature, whereas the electron and ion temperatures can be much higher. These kinds of plasmas enable unique processing of advanced materials at both low pressure and atmospheric pressure. A great deal of the work in Prof. Oehrlein's research group is focused on understanding the interactions of plasma with surfaces of materials and how plasma-surface interactions may be controlled to alter properties of materials in desirable ways.
- Applications of low-temperature plasma science and technology to materials processing
- Surface chemistry and physics of thin film growth
- Etching and modification
- Plasma-surface and plasma-polymer interactions
- In-situ plasma and surface diagnostics
- Physics and chemistry of ion-induced surface processes and of imaging and templating materials
- Nanoscale structure and device fabrication and characterization
- Surface and bulk defects of materials
For a complete list of publications, please visit Professor Oehrlein's web site
- "Characterization and Mechanism of He Plasma Pretreatment of Nanoscale Polymer masks for Improved Pattern Transfer Fidelity," F. Weilnboeck, D. Metzler, N. Kumar, G. S. Oehrlein, R. L. Bruce, S. Engelmann, and N. Fuller, Appl. Phys. Letts. 99, 261501 (2011) (doi: 10.1063/1.3671995).
- "Plasma-Polymer Interactions: A Review of Progress in Understanding Polymer Resist Mask Durab ility during Plasma Etching for Nanoscale Fabrication," G. S. Oehrlein, R. J. Phaneuf, and D. B. Graves, J. Vac. Sci. Technol. B 29 , 010801 (2011). (doi: 10.1116/1.3532949)
- "Poly (2-vinyl naphthalene-b-acrylic acid) Block Copolymer Pattern Formation, Alignment and Pattern Transfer into Silicon by Reactive Ion Etching," Xin Zhang, Christopher Metting, R. M. Briber, Florian Weilnboeck, Sang Hak Shin, Ben Jones, and Gottlieb S. Oehrlein, Macromolecular Chemistry and Physics 212, 1735-1741 (2011). (doi: 10.1002/macp.201100232)
- "On the Absence of Post-Plasma Etch Surface and Line Edge Roughness in Vinylpyridine Resists," R. L. Bruce, F. Weilnboeck, T. Lin, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, C. G. Willson, and A. Alizadeh, J. Vac. Sci. Technol. B 19, 041604 (2011). (doi: 10.1116/1.3607604)
- "Ion and Vacuum Ultraviolet Photon Beam Effects in 193 nm Photoresist Surface Roughening: The Role of the Adamantyl Pendant Group," T. Y. Chung, D. B. Graves, F. Weilnboeck, R. L. Bruce, G. S. Oehrlein, M. Q. Li, and E. A. Hudson, Plasma Processes and Polymers 8, 1068-1079 (2011). (doi: 10.1002/ppap.201100071)
- "Hydrogenation and Surface Density Changes in Hydrocarbon Films during Erosion Using Ar/H2Plasmas," N. Fox-Lyon, G. S. Oehrlein, N. Ning, D. B. Graves, J. Appl. Phys. 110, 104314 (2011). (doi: 10.1063/1.3662953)
- "Molecular Structure Effects on Dry Etching Behavior of Si-containing Resists in Oxygen Plasma," R. L. Bruce, T. Lin, R. J. Phaneuf, G. S. Oehrlein, W. Bell, B. Long, and C. G. Willson, J. Vac. Sci. Technol. B 28 , 751 (2010). (doi: 10.1116/1.3455496)
- "Role of Polymer Structure and Ceiling Temperature in Polymer Roughening and Degradation during Plasma Processing: A Beam System Study of P4MS and P alpha MS," D. Nest, T. Y. Chung, J. J. Vegh, D. B. Graves, R. L. Bruce, T. Lin, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, and C. G. Willson, J. Phys. D - Appl. Phys. 43, 085204 (2010). (doi: 10.1088/0022-3727/43/8/085204)
- "Relationship between Nanoscale Roughness and Ion-Damaged Layer in Argon Plasma Exposed Polystyrene Films," R. L. Bruce, F. Weilnboeck, T. Lin, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, C. G. Willson, J. J. Vegh, D. Next and D. B. Graves, J. Appl. Phys. 107, 084310 (2010). (doi: 10.1063/1.3373587)
- "Electron, Ion and Vacuum Ultraviolet Photon Effects in 193 nm Photoresist Surface Roughening," T. Y. Chung, D. Nest, D. B. Graves, F. Weilnboeck, R. L. Bruce, G. S. Oehrlein, D. Wang, M. Li, and E. A. Hudson, J. Phys. D - Appl. Phys. 43 , 272001 (2010). (doi: 10.1088/0022-3727/43/27/272001 )
- "Photoresist Modifications by Plasma Vacuum Ultraviolet Radiation: The Role of Polymer Structure and Plasma Chemistry," F. Weilnboeck, R. L. Bruce, S. Engelmann, G. S. Oehrlein, D. Nest, T.-Y. Chung, D. Graves, M. Li, D. Wang, C. Andes, and E. A. Hudson, J. Vac. Sci. Technol. B 28 , 993 (2010). (doi: 10.1116/1.3484249)
- "Real-Time and Post-Plasma Studies of Influence of Low Levels of Tungsten on Carbon Erosion and Surface Evolution Behaviour in D2 Plasma," F. Weilnboeck, N. Fox-Lyon, G. S. Oehrlein, and R. P. Doerner, Nucl. Fusion 50, 025027 (2010). (doi: 10.1088/0029-5515/50/2/025027)
- "Surface and Near-Surface Modifications of Ultralow Dielectric Constant Materials Exposed to Plasmas under Sidewall-Like Conditions," Ming-Shu Kuo and G. S. Oehrlein, J. Vac. Sci. & Technol. B 28 , (2010). (doi: 10.1116/1.3499271)
- "Mechanistic Study of Ultralow K-Compatible Carbon Dioxide in situ Photoresist Ashing Processes. I. Process Performance and Influence on ULK Material Modification," Ming-Shu Kuo, A. R. Pal, G. S. Oehrlein, P. Lazzeri, and M. Anderle, J. Vac. Sci. & Technol. B 28 , (2010). (doi: 10.1116/1.3482343)
- "Mechanistic Study of Ultralow k-Compatible Carbon Dioxide in Situ Photoresist Ashing Processes. II. Interaction with Preceding Fluorocarbon Plasma Ultralow k Etching Processes," Ming-Shu Kuo, A. R. Pal, and G. S. Oehrlein, J. Vac. Sci. Technol. B 28 , 961 (2010). (doi: 10.1116/1.3482353)
- "Influence of C4F8/Ar Based Etch and H2 Based Remote Ash Processes on ULK Materials Modifications," M.-S. Kuo, X. Hua, G. S. Oehrlein, A. Ali, P. Jiang, P. Lazzeri, and M. Anderle, J. Vac. Sci. Technol. B 28 , 284 (2010). (doi:10.1116/1.3308623)
- "Stages in the Interaction of Deuterium Atoms with Amorphous Hydrogenated Carbon Films: Isotope Exchange, Soft-Layer Formation, and Steady-State Erosion," G. S. Oehrlein, T. Schwarz-Selinger, K. Schmid, M. Schlüter, and W. Jacob, J. Appl. Phys. 108, 043307 (2010). (doi:10.1063/1.3474988)
- "Plasma-Surface Interactions of Advanced Photoresists with C4F8/Ar Discharges: Plasma Parameter Dependencies," S. Engelmann, R. L. Bruce, M. Sumiya, T. Kwon, R. Phaneuf, G. S. Oehrlein, C. Andes, D. Graves, D. Nest, and E. A. Hudson, J. Vac. Sci. & Technol. B 27 , 92 (2009). (doi: 10.1116/1.3054342)
- "Real-Time Studies of Surface Roughness Development and Reticulation Mechanisms of Advanced Photoresist Materials during Plasma Processing," A. R. Pal, R. L. Bruce, F. Weilnboeck, S. Engelmann, T. Lin, M.-S. Kuo, R. Phaneuf, and G. S. Oehrlein, J. Appl. Phys. 105, 031133 (2009). (doi: 10.1063/1.3055268 )
- "Low-Temperature Plasma-Assisted Nanotransfer Printing between Thermoplastic Polymers," D. Y. Lee, D. R. Hines, C. M. Stafford, C. L. Soles, E. K. Lin, and G. S. Oehrlein, Adv. Mater. 21, 1 (2009). (doi: 10.1002/adma.200803121)
Ten Maryland MSE Faculty Members Ranked in Top 2% of World ScientistsElsevier releases updated science-wide database
10 Maryland MSE Faculty Members Ranked in Top 2% of World ScientistsReport prepared by Stanford University experts.
2020 Dean's Doctoral Student Research AwardsThe competition recognizes distinguished graduate student researchers in order to help propel their careers and demonstrate the value of high-quality engineering research.
MSE Graduate Student Adam Pranda Wins 2019 AVS AwardPranda was honored at the 2019 AVS International Symposium and Exhibition last week.
UMD Graduate Student Kang-Yi Lin Receives 2019 ALD/ALE AwardLin was honored at the 2019 ALD/ALE International Conference this summer.
MSE Professor Recognized by AVS and Dry Process SymposiumGottlieb Oehrlein bestowed the John Thornton Memorial Award and the DPS Nishizawa Award.
Novel Food Sanitation Method Uses Plasma Science to Sterilize Food with the Flip of a SwitchResearchers published findings showing 99% E.coli elimination using nothing but air and a little electricity.
Journal of Vacuum Science and Technology Recognizes OehrleinMSE faculty member recognized for coauthoring various scientific works.
Rubloff One of 9 Finalists for UMD Invention of the YearOffice of Technology Commercialization to announce winners at the Celebration of Innovation and Partnerships, April 29.
Bartis Wins Wylie Fellowship for Research on Plasma for DisinfectionAward supports students in final stages of dissertation work.
Invention of the Year Finalistunprecedented etching control of a material, one atomic layer at a time
“Milestone for Atomic Layer Etching” Highlighted by AVSUMD–IBM’s new technique is precise, controlled, and self-limiting.
Bartis and Wan Join Future Faculty ProgramProgram prepares graduate students for a career in academia.
Over Half of Tenured MSE Professors Are UMD "Research Leaders"Division of Research honors faculty for funded research.
How Technology Choices Affect Us All: I-Course Examines Contexts and ConsequencesENMA 289A designed to fulfill core physical science requirement for students in non-science majors.
MSE Faculty Are UMD "Research Leaders"Half of department's full-time faculty honored by Division of Research.
Three MSE Students Win NSF Graduate Research FellowshipsEpstein, Godo and Nilsson receive highly competitive awards.
Oehrlein, Phaneuf Paper Among AVS' Most DownloadedWork covers plasma-polymer interactions in photolithography at the nanoscale.
Olatunji Godo Wins L-3 ScholarshipMerit-based award supports Clark School students, Great Expectations campaign.
Plasma for Disinfection Study Wins DOE GrantOehrlein, Seog will be first to characterize effects on biological molecules at the monolayer level.
Oehrlein Receives IBM Faculty AwardGift recognizes importance of nanofabrication research to electronics industry.
Feodor Lynen Fellow Joins MSE and IREAPEvelina Vogli to study use of plasma in specialized coating production.
Bruce Wins 2009 AVS Student Merit AwardGrad student recognized for plasma etching work.
Alumnus Publishes Book on Plasma EtchingSebastian Engelmann (Ph.D. '08) outlines improvements to nanoscale device manufacturing.
Bruce Attends US-Australian Program in SydneyARNAM/NSF programs pairs graduate students for collaborations.
Bruce to Attend NSF Program in AustraliaProgram fosters collaborations, provides project leadership training.
Oehrlein Studies Plasma/Wall Interactions on SabbaticalProfessor invited to Germany for his expertise on plasma-surface interaction.
MSE Faculty Continues to Produce "Research Leaders"Professors honored for their efforts to bring sponsored research funds to campus.
5 MSE Professors Recognized for Sponsored ResearchBriber, Oehrlein, Phaneuf, Rubloff, and Wuttig honored at luncheon.
Oehrlein and Phaneuf Receive NSF Grant for Nano ResearchTwo MSE professors were awarded a NSF-NIRT grant for $1.2M to investigate "Nanotechnological Manufacturing: Nanostructured Polymers Designed for Plasma/Energetic Beam Templating of Materials".
65th Annual Physical Electronic ConferenceTaesoon Kwon and Tabassom Tadayyon-Eslami, both MSE graduate students working in Professor Raymond Phaneuf’s research group, participated in the 65th Annual Physical Electronics Conference, held at the University of Wisconsin campus in Madison, Wisconsin from June 20-22, 2005.
Oehrlein Receives 2005 Prize in Plasma Science and TechnologyAmerican Vacuum Society presents award.
Toshiba's Tomohiro Iguchi arrives as ISR Visiting ScientistAugust 2004—Researcher will be working on microelectronics process technology.
- International Plasma Chemistry Society (2017)
- International Union of Pure and Applied Chemistry (2000)
- American Vacuum Society (1998)