Return to Faculty Directory » | Return to Laboratories »

Oehrlein, Gottlieb S.

Gottlieb Oehrlein
Fellow, AVS and IUPAC
2119 Chemical and Nuclear Engineering Building

News About This Professor


Ph.D., State University of New York–Albany, 1981

Research Interests 

Applications of low-temperature plasma science and technology to materials processing, surface chemistry and physics of thin film growth, etching and modification, plasma-surface and plasma-polymer interactions, in-situ plasma and surface diagnostics, physics and chemistry of ion-induced surface processes and of imaging and templating materials, nanoscale structure and device fabrication and characterization, surface and bulk defects of materials.


Download Profesor Oehrlein's C.V. (PDF)

Prior to joining the A. James Clark School of Engineering at the University of Maryland in 2000, Professor Oehrlein was a member of the Department of Physics faculty at the State University of New York–Albany from 1993 to 2000, and a research staff member in IBM's Division of Research at the T.J. Watson Research Center, in Yorktown Heights, NY.

Honors and Awards 

  • 2010 IBM Faculty Award
  • 2005 Plasma Prize, Plasma Science and Technology Division, American Vacuum Society
  • 2003 Invention of the Year Finalist for Method and Device for Nanoscale Plasma Processing of Materials (US Patent #7470329), UMD Office of Technology Commercialization
  • 2002 IBM Faculty Award
  • Fellow, International Union of Pure and Applied Chemistry (2000)
  • Fellow, American Vacuum Society (1998)
  • Thinker Award of Tegal Corporation, SEMICON West (1993)
  • Electronics Division Award of the Electrochemical Society (1992)
  • Six IBM Invention Plateau Awards (1982-1993)
  • IBM Outstanding Technical Achievement Award (1989)
  • Solid State Science and Technology Young Author's Award of the Electrochemical Society (1985)
  • State University of New York Chancellor's Honors Convocation Award for Academic Excellence and a Distinguished Dissertation (1982)
  • Fellow, Institute of International Education, New York (1980)
  • Presidential Fellow, State University of New York, Albany (1978-1981)

Books and Chapters 

G. S. Oehrlein, T.E.F.M. Standaert, P. J. Matsuo, Chapter 9, Plasma etching of low dielectric constant materials, Spring Series in Advanced Microelectronics, Vol. 9, "Low Dielectric Constant Materials for IC Applications" (Springer, Heidelberg, 2002).

G. S. Oehrlein, K. Maex, Y.-C. Joo, S. Ogawa, and J. T. Wetzel, editors, Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectric, MRS Symposium Proceedings Volume 612 (Warrendale, 2001).

Selected Publications 

For a complete list of publications, please visit Professor Oehlein's web site

"Characterization and Mechanism of He Plasma Pretreatment of Nanoscale Polymer masks for Improved Pattern Transfer Fidelity," F. Weilnboeck, D. Metzler, N. Kumar, G. S. Oehrlein, R. L. Bruce, S. Engelmann, and N. Fuller, Appl. Phys. Letts. 99, 261501 (2011) (doi: 10.1063/1.3671995).

"Plasma-Polymer Interactions: A Review of Progress in Understanding Polymer Resist Mask Durab ility during Plasma Etching for Nanoscale Fabrication," G. S. Oehrlein, R. J. Phaneuf, and D. B. Graves, J. Vac. Sci. Technol. B 29 [1], 010801 (2011). (doi: 10.1116/1.3532949)

"Poly (2-vinyl naphthalene-b-acrylic acid) Block Copolymer Pattern Formation, Alignment and Pattern Transfer into Silicon by Reactive Ion Etching," Xin Zhang, Christopher Metting, R. M. Briber, Florian Weilnboeck, Sang Hak Shin, Ben Jones, and Gottlieb S. Oehrlein, Macromolecular Chemistry and Physics 212, 1735-1741 (2011). (doi: 10.1002/macp.201100232)

"On the Absence of Post-Plasma Etch Surface and Line Edge Roughness in Vinylpyridine Resists," R. L. Bruce, F. Weilnboeck, T. Lin, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, C. G. Willson, and A. Alizadeh, J. Vac. Sci. Technol. B 19, 041604 (2011). (doi: 10.1116/1.3607604)

"Ion and Vacuum Ultraviolet Photon Beam Effects in 193 nm Photoresist Surface Roughening: The Role of the Adamantyl Pendant Group," T. Y. Chung, D. B. Graves, F. Weilnboeck, R. L. Bruce, G. S. Oehrlein, M. Q. Li, and E. A. Hudson, Plasma Processes and Polymers 8, 1068-1079 (2011). (doi: 10.1002/ppap.201100071)

"Hydrogenation and Surface Density Changes in Hydrocarbon Films during Erosion Using Ar/H2Plasmas," N. Fox-Lyon, G. S. Oehrlein, N. Ning, D. B. Graves, J. Appl. Phys. 110, 104314 (2011). (doi: 10.1063/1.3662953)

"Molecular Structure Effects on Dry Etching Behavior of Si-containing Resists in Oxygen Plasma," R. L. Bruce, T. Lin, R. J. Phaneuf, G. S. Oehrlein, W. Bell, B. Long, and C. G. Willson, J. Vac. Sci. Technol. B 28 [4], 751 (2010). (doi: 10.1116/1.3455496)

"Role of Polymer Structure and Ceiling Temperature in Polymer Roughening and Degradation during Plasma Processing: A Beam System Study of P4MS and P alpha MS," D. Nest, T. Y. Chung, J. J. Vegh, D. B. Graves, R. L. Bruce, T. Lin, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, and C. G. Willson, J. Phys. D - Appl. Phys. 43, 085204 (2010). (doi: 10.1088/0022-3727/43/8/085204)

"Relationship between Nanoscale Roughness and Ion-Damaged Layer in Argon Plasma Exposed Polystyrene Films," R. L. Bruce, F. Weilnboeck, T. Lin, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, C. G. Willson, J. J. Vegh, D. Next and D. B. Graves, J. Appl. Phys. 107, 084310 (2010). (doi: 10.1063/1.3373587)

"Electron, Ion and Vacuum Ultraviolet Photon Effects in 193 nm Photoresist Surface Roughening," T. Y. Chung, D. Nest, D. B. Graves, F. Weilnboeck, R. L. Bruce, G. S. Oehrlein, D. Wang, M. Li, and E. A. Hudson, J. Phys. D - Appl. Phys. 43 [27], 272001 (2010). (doi: 10.1088/0022-3727/43/27/272001 )

"Photoresist Modifications by Plasma Vacuum Ultraviolet Radiation: The Role of Polymer Structure and Plasma Chemistry," F. Weilnboeck, R. L. Bruce, S. Engelmann, G. S. Oehrlein, D. Nest, T.-Y. Chung, D. Graves, M. Li, D. Wang, C. Andes, and E. A. Hudson, J. Vac. Sci. Technol. B 28 [5], 993 (2010). (doi: 10.1116/1.3484249)

"Real-Time and Post-Plasma Studies of Influence of Low Levels of Tungsten on Carbon Erosion and Surface Evolution Behaviour in D2 Plasma," F. Weilnboeck, N. Fox-Lyon, G. S. Oehrlein, and R. P. Doerner, Nucl. Fusion 50, 025027 (2010). (doi: 10.1088/0029-5515/50/2/025027)

"Surface and Near-Surface Modifications of Ultralow Dielectric Constant Materials Exposed to Plasmas under Sidewall-Like Conditions," Ming-Shu Kuo and G. S. Oehrlein, J. Vac. Sci. & Technol. B 28 [6], (2010). (doi: 10.1116/1.3499271)

"Mechanistic Study of Ultralow K-Compatible Carbon Dioxide in situ Photoresist Ashing Processes. I. Process Performance and Influence on ULK Material Modification," Ming-Shu Kuo, A. R. Pal, G. S. Oehrlein, P. Lazzeri, and M. Anderle, J. Vac. Sci. & Technol. B 28 [5], (2010). (doi: 10.1116/1.3482343)

"Mechanistic Study of Ultralow k-Compatible Carbon Dioxide in Situ Photoresist Ashing Processes. II. Interaction with Preceding Fluorocarbon Plasma Ultralow k Etching Processes," Ming-Shu Kuo, A. R. Pal, and G. S. Oehrlein, J. Vac. Sci. Technol. B 28 [5], 961 (2010). (doi: 10.1116/1.3482353)

"Influence of C4F8/Ar Based Etch and H2 Based Remote Ash Processes on ULK Materials Modifications," M.-S. Kuo, X. Hua, G. S. Oehrlein, A. Ali, P. Jiang, P. Lazzeri, and M. Anderle, J. Vac. Sci. Technol. B 28 [2], 284 (2010). (doi:10.1116/1.3308623)

"Stages in the Interaction of Deuterium Atoms with Amorphous Hydrogenated Carbon Films: Isotope Exchange, Soft-Layer Formation, and Steady-State Erosion," G. S. Oehrlein, T. Schwarz-Selinger, K. Schmid, M. Schlüter, and W. Jacob, J. Appl. Phys. 108, 043307 (2010). (doi:10.1063/1.3474988)

"Plasma-Surface Interactions of Advanced Photoresists with C4F8/Ar Discharges: Plasma Parameter Dependencies," S. Engelmann, R. L. Bruce, M. Sumiya, T. Kwon, R. Phaneuf, G. S. Oehrlein, C. Andes, D. Graves, D. Nest, and E. A. Hudson, J. Vac. Sci. & Technol. B 27 [1], 92 (2009). (doi: 10.1116/1.3054342)

"Real-Time Studies of Surface Roughness Development and Reticulation Mechanisms of Advanced Photoresist Materials during Plasma Processing," A. R. Pal, R. L. Bruce, F. Weilnboeck, S. Engelmann, T. Lin, M.-S. Kuo, R. Phaneuf, and G. S. Oehrlein, J. Appl. Phys. 105, 031133 (2009). (doi: 10.1063/1.3055268 )

"Low-Temperature Plasma-Assisted Nanotransfer Printing between Thermoplastic Polymers," D. Y. Lee, D. R. Hines, C. M. Stafford, C. L. Soles, E. K. Lin, and G. S. Oehrlein, Adv. Mater. 21, 1 (2009). (doi: 10.1002/adma.200803121)

Related News 

 Journal of Vacuum Science and Technology Recognizes Oehrlein
MSE faculty member recognized for coauthoring various scientific works. December 14, 2015

Rubloff One of 9 Finalists for UMD Invention of the Year
Office of Technology Commercialization to announce winners at the Celebration of Innovation and Partnerships, April 29. March 24, 2015

Bartis Wins Wylie Fellowship for Research on Plasma for Disinfection
Award supports students in final stages of dissertation work. May 27, 2014

Invention of the Year Finalist
unprecedented etching control of a material, one atomic layer at a time April 23, 2014

“Milestone for Atomic Layer Etching” Highlighted by AVS
UMD–IBM’s new technique is precise, controlled, and self-limiting. February 6, 2014

Bartis and Wan Join Future Faculty Program
Program prepares graduate students for a career in academia. January 27, 2014

Over Half of Tenured MSE Professors Are UMD "Research Leaders"
Division of Research honors faculty for funded research. December 3, 2013

How Technology Choices Affect Us All: I-Course Examines Contexts and Consequences
ENMA 289A designed to fulfill core physical science requirement for students in non-science majors. November 1, 2012

MSE Faculty Are UMD "Research Leaders"
Half of department's full-time faculty honored by Division of Research. October 9, 2012

Three MSE Students Win NSF Graduate Research Fellowships
Epstein, Godo and Nilsson receive highly competitive awards. April 13, 2012

Oehrlein, Phaneuf Paper Among AVS' Most Downloaded
Work covers plasma-polymer interactions in photolithography at the nanoscale. June 6, 2011

Olatunji Godo Wins L-3 Scholarship
Merit-based award supports Clark School students, Great Expectations campaign. March 15, 2011

UMD Hosts Ionizing Radiation and Polymers Symposium
Event chaired by MSE Professor Mohamad Al-Sheikhly. November 4, 2010

Plasma for Disinfection Study Wins DOE Grant
Oehrlein, Seog will be first to characterize effects on biological molecules at the monolayer level. September 23, 2010

Oehrlein Receives IBM Faculty Award
Gift recognizes importance of nanofabrication research to electronics industry. September 14, 2010

Feodor Lynen Fellow Joins MSE and IREAP
Evelina Vogli to study use of plasma in specialized coating production. April 6, 2010

Briber, Oehrlein Courses Selected for I-Series
Faculty bring innovative science education to non-majors. March 8, 2010

Oehrlein, Arsenault Highly Cited Worldwide
Professors featured on Thomson Reuters' February 22, 2010

Bruce Wins 2009 AVS Student Merit Award
Grad student recognized for plasma etching work. December 2, 2009

Alumnus Publishes Book on Plasma Etching
Sebastian Engelmann (Ph.D. '08) outlines improvements to nanoscale device manufacturing. November 3, 2009

Bruce Attends US-Australian Program in Sydney
ARNAM/NSF programs pairs graduate students for collaborations. September 11, 2008

Bruce to Attend NSF Program in Australia
Program fosters collaborations, provides project leadership training. May 9, 2008

Oehrlein Studies Plasma/Wall Interactions on Sabbatical
Professor invited to Germany for his expertise on plasma-surface interaction. December 19, 2007

MSE Faculty Continues to Produce "Research Leaders"
Professors honored for their efforts to bring sponsored research funds to campus. October 29, 2007

Phaneuf Invited to Lecture in Germany, Italy
Professor shares recent work on GaAs(001) mechanisms. December 7, 2006

5 MSE Professors Recognized for Sponsored Research
Briber, Oehrlein, Phaneuf, Rubloff, and Wuttig honored at luncheon. November 28, 2006

Oehrlein and Phaneuf Receive NSF Grant for Nano Research
Two MSE professors were awarded a NSF-NIRT grant for $1.2M to investigate "Nanotechnological Manufacturing: Nanostructured Polymers Designed for Plasma/Energetic Beam Templating of Materials". February 27, 2006

65th Annual Physical Electronic Conference
Taesoon Kwon and Tabassom Tadayyon-Eslami, both MSE graduate students working in Professor Raymond Phaneuf’s research group, participated in the 65th Annual Physical Electronics Conference, held at the University of Wisconsin campus in Madison, Wisconsin from June 20-22, 2005. February 27, 2006

Oehrlein Receives 2005 Prize in Plasma Science and Technology
American Vacuum Society presents award. February 2, 2006

Toshiba's Tomohiro Iguchi arrives as ISR Visiting Scientist
August 2004—Researcher will be working on microelectronics process technology. August 9, 2004